SEM5000 is a field emission scanning electron microscope with high resolution and rich functions. It has advanced lens barrel design, deceleration inside the lens barrel, low aberration and no magnetic leakage objective lens design, which realizes low-voltage high-resolution imaging and is applicable to on magnetic samples. SEM5000 has optical navigation, complete automatic functions, well-designed human-computer interaction, and optimized operation and use process.
No matter whether the operator has rich experience or not, he can quickly get started and complete high-resolution shooting tasks.
| Electron gun type | high brightness Schottky field emission electron gun |
| Resolution | 1 nm @ 15 kV |
| 1.5nm @ 1kV | |
| Magnification | 1 ~ 1000000 x |
| Acceleration voltage | 20 V ~ 30 kV |
| Sample stage | five-axis automatic sample stage |
Features
- High resolution, high-resolution imaging under low acceleration voltage
- The electromagnetic composite objective lens can reduce aberration, significantly improve the resolution under low voltage, and can observe magnetic samples
- The deceleration in the lens barrel, the electrons in the tunnel can maintain high energy, reduce the space charge effect, and ensure low voltage resolution
- There is no crossover in the electronic optical path, effectively reducing system aberration and improving resolution
- The water-cooled constant temperature objective lens ensures the stability, reliability and repeatability of the objective lens work
- Magnetic deflection six-aperture adjustable aperture, automatic switching aperture aperture, no need for mechanical adjustment, to achieve high-resolution observation or fast switching of large beam analysis mode
Application field
Field emission scanning electron microscope SEM5000 can be widely used in lithium batteries, chip semiconductors, ceramics, building materials, electronic components, chemical engineering, biomedical, environmental protection, metal materials and other fields.
Field emission scanning electron microscope SEM5000 shooting case
Cherry blossom pollen (Pseudo-color processing)
NVP
TIO2
Lithium titanate
Positive electrode
Negative pole piece
Conductive additives on the surface of the pole piece
Diaphragm
About Field Emission SEM
Field Emission Scanning Electron Microscope (FESEM)
Field emission scanning electron microscopy (FESEM) can provide morphology and elemental information at a magnification of 10 to 300000 times, and has almost infinite depth of field. Compared with traditional scanning electron microscopy (SEM), field emission SEM (FESEM) can generate clearer and less electrostatic distortion images, with a spatial resolution as low as 1 1/2 nanometers, which is three to six times higher.
Other advantages of FESEM include:
- Capable of detecting small areas of contamination points under electron acceleration voltage compatible with energy dispersive spectroscopy (EDS).
- The penetration force of low kinetic energy electron probes decreases and is closer to the material surface.
- High-quality, low-voltage images, with negligible sample charging (acceleration voltage range from 0.5 to 30 kV).
- Basically, there is no need to place conductive coatings on insulation materials.
Application of FESEM
Cross-section analysis of semiconductor devices, including gate width, gate oxide, film thickness, and structural details
Advanced coating thickness and structural uniformity measurement
Measurement of geometric shape and elemental composition of small pollution features
Operational principle
The field emission cathode in the scanning electron microscope electron gun provides a narrower detection beam at low and high electron energies, thereby improving spatial resolution and minimizing sample charging and damage.